Boron-11 Trifluoride (¹¹BF₃, BF3-11): Key Specifications, Semiconductor Applications and Tianhesheng Isotopes Products

Boron-11 trifluoride (¹¹BF₃, also written as 11BF3 or BF3-11) is boron trifluoride enriched in the boron-11 isotope. Electronic-grade boron-11 trifluoride can serve as a boron source for p-type doping through semiconductor ion implantation.

Tianjin Tianhesheng Advanced Material Technology Co., Ltd. (“Tianhesheng Isotopes”) supplies electronic-grade boron-11 trifluoride with boron-11 isotopic enrichment ≥99.8%, supporting semiconductor customers’ material selection and procurement requirements.

1. Key Specifications for Boron-11 Trifluoride

When selecting electronic-grade boron-11 trifluoride, isotopic enrichment and chemical purity must be evaluated separately. Neither specification substitutes for the other.

Boron-11 Isotopic Enrichment

Isotopic enrichment indicates the proportion of boron-11 within the boron content. Tianhesheng Isotopes specifies boron-11 enrichment ≥99.8% for its boron-11 trifluoride.

Buyers should confirm the guaranteed enrichment level, measurement method and batch-specific test information, distinguishing enriched boron-11 products from boron trifluoride with a natural isotopic composition.

Gas Purity and Impurity Control

Electronic-grade products also require attention to chemical purity and limits for impurities such as moisture, oxygen and metals. An isotopic enrichment of 99.8% does not mean that the gas has a chemical purity of 99.8%.

The applicable purity grade, impurity limits and analytical methods should be confirmed through the supplier’s technical specifications and batch certificate of analysis (COA).

Packaging and Delivery Conditions

Cylinder specifications, valve connections, fill quantities and compatibility with the gas delivery system are also important selection criteria. These should be confirmed against the customer’s equipment and operating conditions.

2. How to Choose a Boron-11 Trifluoride Supplier

Review product specifications and analytical documentation. Confirm the guaranteed isotopic enrichment, chemical purity, key impurity limits and supporting test documentation to determine whether the product meets the intended process requirements.

Assess production capabilities and supply conditions. Review the supplier’s isotope separation technology, production status, batch consistency and lead times. Design capacity provides useful context, but actual supply capability should be assessed against operational status and order conditions.

Evaluate quality management and traceability. Consider quality controls across raw materials, production, testing, cylinder filling and delivery, together with batch traceability and technical support.

Confirm compliant delivery capabilities. For exports, determine the applicable export control requirements based on the specific product, destination, end user and end use.

3. Boron-11 Trifluoride in Semiconductor Ion Implantation

Electronic-grade boron-11 trifluoride can serve as a boron source for semiconductor ion implantation, providing boron ions for p-type doping. Material selection should consider isotopic composition, chemical purity, ion source operating conditions and equipment compatibility.

For chip manufacturers and process development teams, technical specifications, batch test documentation and sample evaluation support can assist material qualification. Actual process performance should be verified using the customer’s equipment and operating conditions.

4. Tianhesheng Isotopes Boron-11 Trifluoride

Tianjin Tianhesheng Advanced Material Technology Co., Ltd. focuses on boron isotope materials research, development and production. Its electronic-grade boron-11 trifluoride product and process information are summarized below:

• Product: Electronic-grade boron-11 trifluoride (¹¹BF₃, 11BF3, BF3-11).

• Isotopic enrichment: Boron-11 ≥99.8%.

• Production process: An independently developed continuous production process based on chemical-exchange distillation.

• Granted patent: Chinese invention patent CN116688756B, “A Process Method for Continuous Production through Boron Isotope Separation.”

• Design capacity: Approximately 5 metric tons per year, according to publicly available environmental impact assessment documents.

• Target applications: Semiconductor ion implantation and other applications requiring an enriched boron-11 source.

For information on gas purity, impurity specifications, cylinder options, delivery schedules or sample testing, please contact Tianhesheng Isotopes.

Telephone: +86-22-82060520
Email: contact@thsisotope.com